Scientific Article | Ici, l’accumulation des ions cuivreux dans une solution en une expérience de modèle et d’une analyse fondée sur des mesures
Knowledge of the behavior of cuprous ions (monovalent copper ion: Cu(I)) in a copper sulfate plating bath is important for improving the plating process.
Copper electroplating fundamentals
Structure of 1:2 complex between Cu(I) and BCS chelate.
1-(4-Hydroxyphenyl)-2 H -tetrazole-5-thione as a leveler for acid copper electroplating of microvia - RSC Advances (RSC Publishing) DOI:10.1039/D2RA02274E
1-(4-Hydroxyphenyl)-2 H -tetrazole-5-thione as a leveler for acid copper electroplating of microvia - RSC Advances (RSC Publishing) DOI:10.1039/D2RA02274E
Copper Electroplating: How It Works and Its Applications
4,6-Dimethyl-2-mercaptopyrimidine as a potential leveler for microvia filling with electroplating copper - RSC Advances (RSC Publishing) DOI:10.1039/C7RA06857C
CN101922027B - Cyanide-free alkaline copper plating solution and preparation method thereof - Google Patents
Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution
Copper Plating - an overview
CN101922027B - Cyanide-free alkaline copper plating solution and preparation method thereof - Google Patents
Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution